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Press Releases

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12. May 2011 | Press Releases

Transphorm to offer cost effective power conversion with AIXTRON 6-inch GaN-on-Silicon system

AIXTRON SE today announced a new order for an AIX 2800G4 HT system in a 6x6-inch wafer configuration from US start-up company Transphorm Inc. It will be used to ramp up Transphorm´s production capabilities of GaN devices for highly efficient and compact power conversion solutions by rapidly transferring the company´s GaN on Si material growth technology to large scale production.

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02. May 2011 | Press Releases

AIXTRON ships another next generation QXP-8300 ALD deposition tool to major Korean customer

AIXTRON SE (FSE: AIX; NASDAQ: AIXG) today announced shipment of an additional next generation QXP-8300 advanced atomic layer deposition tool to another leading Korean DRAM manufacturer.

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21. April 2011 | Press Releases

AIXTRON CRIUS II qualified in Taiwan

AIXTRON SE announced today that its latest Close Coupled Showerhead MOCVD platform system, the CRIUS II, has been successfully qualified for mass production within the Chi Mei Group, based in southern Taiwan, outperforming expectations as to process stability, uniformity, and throughput.

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19. April 2011 | Press Releases

Taiwan’s Epistar receives further AIXTRON G5 reactors

Repeat order for production qualified MOCVD systems

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11. April 2011 | Press Releases

AIXTRON sells first 300mm Graphene System to AIST

AIXTRON SE today announced a new order for the first automated 300mm Black Magic system for Graphene deposition from the National Institute of Advanced Industrial Science and Technology (AIST) in Japan. The unique properties of Graphene make it an extremely promising channel material for next generation microelectronics and high frequency applications.

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