DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS & NOVEL MATERIALS

Closed Coupled Showerhead® CCS and NOVO Systems for R&D

“Flexible MOCVD system for R&D and small scale production”

Key Benefits

  • Versatile R&D platform with integrated glovebox
    • True scaling from R&D to mass production
    • Inherently uniform and reproducible growth for all material systems
    • High flexibility in process window for excellent material quality and uniformity
  • Ideal for small R&D budgets: lowest running cost
    • Low gas flows and high precursor efficiency
    • Easy and low cost maintenance

Product Features

  • High flexibility for various MO and hydride sources
  • Digital mass flow controllers and pressure controllers
  • Professional AIXACT® Advanced Control System with HTML-based GUI
  • Compact footprint

CCS

  • Proven Close Coupled Showerhead® reactor with 3-zone heater
  • Dynamic process gap adjustment – effective process tuning for higher performance
  • 1400°C surface temperature option
  • In-situ monitoring with Laytec EpiTT, EpiCurveTT, and others on request
  • AIXTRON ARGUS full wafer temperature mapping
  • AIXTRON EPISON® gas concentration sensors Configurations (by simple carrier exchange):
    • 3x2 inch, 1x3 inch, 1x4 inch
    • 6x2 inch, 7x2 inch, 3x3 inch, 1x4 inch, 1x6 inch
    • 19x2 inch, 7x3 inch, 5x4 inch, 1x6 inch, 1x8 inch
       

NOVO

  • Cold wall thermal and plasma enhanced CVD showerhead reactor
  • Remote and substrate plasma
  • 1050°C surface temperature
  • Capacity for 1x4 inch wafer or small samples
  • Optional turbo pump for reactor
     

 

CCS / NOVO Systems for R&D

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Your contact person

AIXTRON Ltd. UK

Dr. Andrew Pakes

Product Manager

Phone: +44 1954 208 465

Fax: +44 1223 519 888

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