DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS

AIX G5+ C

“State-of-the-art Planetary reactor module increases productivity and wafer performance”

Key Benefits

  • Chosen by the best in the industry
  • Highest throughput
  • Lowest Cost of Ownership
  • Highest yield performance
  • 1st fully automated MOCVD platform with Cl2 in-situ cleaning and cassette-to-cassette wafer handler

Product Features

  • Cost advantages of a batch reactor combined with the unique axis symmetric on-wafer uniformity of a single wafer reactor with respect to:
    • wafer bow
    • layer thickness, material composition, dopant concentration
    • component yield
  • Warm ceiling provides lowest heat flux through the wafers
    • Minimized wafer curvature due to minimal vertical temperature gradients
    • Enables the use of Si wafers with standard thickness
  • Wafer temperature optimization through customer-specific design of the substrate pockets

Configurations

  • 8x150 mm
  • 5x200 mm

AIX G5+ C reactor module with cassette-to-cassette wafer handler

Your contact person

Product Management

Dr. Jens Voigt

Director