DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS

AIX 2800G4-TM (IC2)

“The best reactor for HVM of GaAs/InP based Optoelectronics and RF applications”

Key Benefits

  • Best Deposition Uniformity Control – at wafer level
  • Lowest Particle Count
  • Highest Product Yield
  • Lowest Production Cost

Product Features

  • Unique true horizontal flow Planetary Reactor – Built in best uniformity & highest efficiency
  • All graphite process chamber – lowest particles and highest repeatability performance
  • Triple process gas injection – maxed out yield optimization
  • Single wafer rotation – combining batch chamber productivity with single chamber tunability
  • Automated satellite loading at high temperature– highest throughput, lowest particles

Configurations

  • 15x4 inch
  • 8x6 inch

AIX 2800G4-TM (IC2)

Your contact person

Product Management

Dr. Jens Voigt

Director