China’s National Nano Center Orders AIXTRON System for Nanotubes and Graphene

AIXTRON SE today announced that China’s National Center for Nanoscience and Technology (NCNST) has ordered AIXTRON’s BM R&D system for the growth of carbon-based structures such as nanotubes and graphene on 2-inch substrates. The system will be supported by AIXTRON’s local Chinese office.

Dr. Qing Dai from NCNST, comments: “Our research currently focuses on the characterization of carbon nanotubes (CNT) and on plasmonic properties of graphene. Our goal is to build nanophotonic devices such as terahertz waveguides. We will also utilize the system for growing 3D nanostructures combining CNT and graphene which both possess the potential for active controlled plasmonic devices.”

AIXTRON’s BM system features high performance heating with ramping rates of up to 1000°C/minute, and can operate in both thermal and plasma-enhanced chemical vapor deposition modes. Equipped with automatic process control this ensures that reproducible, high quality films are consistently deposited.

Dr. Dai adds, “Uniform films are especially important for the coupling and propagating of surface plasmons, and process repeatability is crucial in building these devices. Having used the BM system myself, I am completely confident that the AIXTRON tool will meet our requirements for producing CNT and graphene films.”

Following his Masters in Engineering at Imperial College London, Dr Dai pursued a PhD at the University of Cambridge (UK) investigating photonic devices. He holds prestigious positions such as a Junior Research Fellowship at Wolfson College, University of Cambridge, and is also on the Global Experts Program supported by the Chinese central government. He joined NCNST as an Associate Professor of Material Science in 2012. NCNST was co-founded by the Chinese Academy of Sciences (CAS) and the Chinese Ministry of Education as a public technological research base for nanoscience with state-of-the-art equipment open to both domestic and international users.

Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®