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21. April 2011 | Press Releases

AIXTRON CRIUS II qualified in Taiwan

AIXTRON SE announced today that its latest Close Coupled Showerhead MOCVD platform system, the CRIUS II, has been successfully qualified for mass production within the Chi Mei Group, based in southern Taiwan, outperforming expectations as to process stability, uniformity, and throughput.

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19. April 2011 | Press Releases

Taiwan’s Epistar receives further AIXTRON G5 reactors

Repeat order for production qualified MOCVD systems

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11. April 2011 | Press Releases

AIXTRON sells first 300mm Graphene System to AIST

AIXTRON SE today announced a new order for the first automated 300mm Black Magic system for Graphene deposition from the National Institute of Advanced Industrial Science and Technology (AIST) in Japan. The unique properties of Graphene make it an extremely promising channel material for next generation microelectronics and high frequency applications.

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05. April 2011 | Press Releases

TU Eindhoven to provide advanced nanowire structures with AIXTRON CCS MOCVD system

AIXTRON SE today announced a new MOCVD reactor order from existing customer, the University of Technology (TU) Eindhoven in the Netherlands. The contract is for one Close Coupled Showerhead (CCS) system in a 3x2-inch wafer configuration which will be used for the growth of GaAs- and InP-based nanowire structures as well as for nitrides and silicon compounds.

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31. March 2011 | Press Releases

PARC orders AIXTRON CCS MOCVD system for InGaAlN lasers and light emitting devices

AIXTRON SE announced today a new order for a Close Coupled Showerhead (CCS) MOCVD system from PARC, a Xerox company, in Palo Alto, CA, USA. The system will include the full set of advanced features such as the in-situ multichannel pyrometer ARGUS, high temperature growth, and gap adjustment for optimum (Al)GaN conditions in a wide pressure range.

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