18. October 2022 |

Furukawa in Japan selects AIXTRONs MOCVD technology for the production of optoelectronic devices / AIXTRON to support development of GaAs and InP based optoelectronics in Japan

EQS-Media / 18.10.2022 / 07:30 CET/CEST Furukawa in Japan selects AIXTRONs MOCVD technology for the production of optoelectronic devicesAIXTRON to support development of GaAs and InP based optoelectronics in JapanHerzogenrath, October 18, 2022 – AIXTRON SE (FSE: AIXA), a worldwide leading provider of


EQS-Media / 18.10.2022 / 07:30 CET/CEST

Furukawa in Japan selects AIXTRONs MOCVD technology for the production of optoelectronic devices

AIXTRON to support development of GaAs and InP based optoelectronics in Japan

Herzogenrath, October 18, 2022 – AIXTRON SE (FSE: AIXA), a worldwide leading provider of deposition equipment to the semiconductor industry, has received an order for an AIX 2800G4 MOCVD System from FURUKAWA FITEL OPTICAL DEVICE CO., LTD. (FFOD), a Japan based manufacturer of compound semiconductor devices. The equipment will be used for the development and the production of optoelectronic devices, based on Gallium Arsenide (GaAs) and Indium Phosphide (InP) materials. 

The AIX 2800G4 platform is the established and market-leading equipment for the production of various semiconductor devices due to the unmatched performance of the Planetary Reactor® concept with respect to thickness and wavelength uniformity control of epitaxial layers. The proven system for high volume manufacturing provides highest efficiency in the use of chemicals while delivering superior yields for most advanced optical devices thanks to wafer level process control.

"We are very pleased to see Furukawa becoming one of our G4 users. The platform is the reliable and established industry standard for most demanding epitaxial requirements and has contributed to the success of many customers. With our team of hardware and process experts in Japan, we are looking forward to this new cooperation, supporting Furukawa to swiftly ramp up the platform for their existing and future products," says Dr. Felix Grawert, CEO & President of AIXTRON SE.

 


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About AIXTRON

AIXTRON SE is a leading provider of deposition equipment to the semiconductor industry. The Company was founded in 1983 and is headquartered in Herzogenrath (near Aachen), Germany, with subsidiaries and sales offices in Asia, United States and in Europe. AIXTRON´s technology solutions are used by a diverse range of customers worldwide to build advanced components for electronic and optoelectronic applications based on compound semiconductor materials. Such components are used in a broad range of innovative applications, technologies and industries. These include Laser and LED applications, display technologies, data transmission, SiC and GaN power management and conversion, communication, signaling and lighting as well as a range of other leading-edge applications.

Our registered trademarks: AIXACT®, AIXTRON®, , Close Coupled Showerhead®, EXP®, EPISON®, Gas Foil Rotation®, OptacapTM, OVPD®, Planetary Reactor®, PVPD®, STExS®, TriJet®

For further information on AIXTRON (FSE: AIXA, ISIN DE000A0WMPJ6) please visit our website at: www.aixtron.com

Forward-Looking Statements

This document may contain forward-looking statements regarding the business, results of operations, financial condition and earnings outlook of AIXTRON. These statements may be identified by words such as “may”, “will”, “expect”, “anticipate”, “contemplate”, “intend”, “plan”, “believe”, “continue” and “estimate” and variations of such words or similar expressions. These forward-looking statements are based on our current assessments, expectations and assumptions, of which many are beyond control of AIXTRON, and are subject to risks and uncertainties. You should not place undue reliance on these forward-looking statements. Should these risks or uncertainties materialize, or should underlying expectations not occur or assumptions prove incorrect, actual results, performance or achievements of AIXTRON may materially vary from those described explicitly or implicitly in the relevant forward-looking statement. This could result from a variety of factors, such as actual customer orders received by AIXTRON, the level of demand for deposition technology in the market, the timing of final acceptance of products by customers, the condition of financial markets and access to financing for AIXTRON, general conditions in the market for deposition plants and macroeconomic conditions, cancellations, rescheduling or delays in product shipments, production capacity constraints, extended sales and qualification cycles, difficulties in the production process, the general development in the semi-conductor industry, increased competition, fluctuations in exchange rates, availability of public funding, fluctuations and/or changes in interest rates, delays in developing and marketing new products, a deterioration of the general economic situation and any other factors discussed in any reports or other announcements , in particular in the chapter Risks in the Annual Report, filed by AIXTRON. Any forward-looking statements contained in this document are based on current expectations and projections of the executive board based on information available the date hereof. AIXTRON undertakes no obligation to revise or update any forward-looking statements as a result of new information, future events or otherwise, unless expressly required to do so by law. 

 

This document is an English language translation of a document in German language. In case of discrepancies, the German language document shall prevail and shall be the valid version.



End of Media Release


Issuer: AIXTRON SE
Key word(s): Research/Technology

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Our registered trademarks: AIXACT®, AIXTRON®, Atomic Level Solutions®, Close Coupled Showerhead®, CRIUS®, EXP®, EPISON®, Gas Foil Rotation®, Optacap™, OVPD®, Planetary Reactor®, PVPD®, STExS®, Trijet®

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