(PE)CVD, Graphen und Kohlenstoff-Nanomaterialien
AIXTRON’s CVD and PECVD equipment enables customers to reproducibly and uniformly deposit graphene, carbon nanotubes and semiconducting nanowires. Our systems incorporate the latest process technologies and are based upon the showerhead, vertical flow concept which delivers both uniformity and scalability, rapid heating and plasma-based processing to successfully grow mono and multi layer graphene and various types of nanotubes and nanowires.
The following turnkey systems are available:
- BM R&D – for deposition on 2-inch or small samples
- BM Pro – for 4-inch, 6-inch and 8-inch diameter substrates
- BM 300 – for automated production on industry standard 300mm wafers
Contact us to learn about the benefits of our equipment!