DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS

AIX R6

“Workhorse for High Volume and Cost Efficient Manufacturing of GaN LEDs”

Key Benefits

  • Large reactor capacity
  • Maximized throughput
  • Automation
  • Continuous runs
  • Reliability and uptime
  • Intrinsic yield and uniformity by Close Coupled Showerhead®
  • Multi-zone in-situ topside temperature control
  • Improved temperature homogeneity for run-to-run consistency

Product Features

  • Automated carrier load and unload at high temperature
  • Flexible configuration in between 2, 4 and 6 inch wafers
  • Dynamic process chamber height adjustment
  • LayTec Advanced Process Control
  • User friendly operator interface

Configurations

  • 121 x 2 inch
  • 31 x 4 inch
  • 12 x 6 inch

Your contact person

Product Management

Dr. Jens Voigt

Director