TECHNOLOGIES

Plasma-Chemical Vapor Deposition (PE)CVD

AIXTRON's unique plasma-assisted deposition technology enables a very flexible process. It can be used to produce various nanomaterials. Plasma complements the thin film coating process and thus provides the basis for the synthesis of almost all possible variants and forms of graphene, carbon nanotubes and carbon nanowires. In addition, process temperatures can be reduced and various surfaces prepared.