AIXTRON Technologies

INNOVATION

AIXTRON TECHNOLOGIES

With our leading material coating technologies, we are driving the strategic application markets for compound semiconductors and nanomaterials. For our customers, this means an extensive selection of technologies for the production of different layer structures for the most diverse types of components.

compound semiconductors

compound semiconductors

MOCVD

We are the world leader in the manufacture of MOCVD material coating equipment.

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compound semiconductors

compound semiconductors

PLANETARY-PRINCIPLE (MOCVD)

The Planetary Reactor ® is based on the principle of a horizontal laminar flow reactor. This ensures the sharpest transitions...

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compound semiconductors

compound semiconductors

SHOWERHEAD-PRINCIPLE (MOCVD)

The Close Coupled Showerhead (CCS) concept allows a variety of susceptor substrate configurations with a maximum capacity of 69x2 or 19x4 inch wafers.

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2D nanotechnologY

2D nanotechnologY

Warm-wall planetARY principle (SIC-CVD)

Unmatched production capacity and the most effective use of precursor materials.

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2D NANOTECHNOLOGY

2D NANOTECHNOLOGY

Plasma-Enhanced Chemical Vapor Deposition (PE)CVD

PECVD to deposit flexible barrier films for thin-film encapsulation.