DEPOSITION SYSTEM FOR CARBON NANOMATERIALS

BM 300T

“The industry’s tool of reference for your production needs”

Key Benefits

  • Uniform deposition of graphene and carbon nanotubes on 200 mm and 300 mm wafers
  • Thermal and Plasma Enhanced CVD for process flexibility
  • 3-zone substrate heating, max. temperature
    1050 °C
  • Independent 3-zone top heater
  • Compatible with multi or single wafer transfer module

Product Features

  • Showerhead based technology
  • Substrate rotation
  • Automatic process control with proven recipes
  • Multi-user management and reporting tools
  • Safety system with full data logging

Substrate size / configurations

  • 300 mm (12-inch) or 200 mm (8-inch) wafer sizes
  • Liquid precursor delivery
  • Extra ports/feedthroughs for in-situ analysis

BM 300T

Your contact person

AIXTRON Ltd. UK

Oliver Whear

Product Manager