DEPOSITION SYSTEM FOR 2D NANOMATERIALS

BM NOVO LITE

“Your R&D platform for 2D materials”

Key Benefits

  • Uniform deposition of 2D materials (e.g. TMDCs, h-BN) on wafer and foil substrates
  • Dual channel showerhead for improved efficiency
  • Plasma showerhead technology for process flexibility
  • Temperatures up to 1050 °C
  • Up to 3 metal organic sources

Product Features

  • Cold wall thermal and plasma enhanced CVD technology
  • Small footprint
  • Remote and substrate plasma Bottom and top heating technology
  • Up to 7 gas sources
  • Automatic process control with proven recipes
  • Multi-user management and reporting tools
  • Safety system with full data logging

Substrate size / configurations

  • Up to 6-inch substrate size
  • Extra feedthrough ports for in-situ monitoring
  • Liquid delivery
  • Turbo pumping

BM NOVO LITE

Your contact person

Product Management

Dr. Jens Voigt

Director