DEPOSITION SYSTEM FOR 2D NANOMATERIALS

BM NOVO

“Leading R&D platform for 2D materials”

Key Benefits

  • Uniform deposition of 2D materials (e.g. TMDCs, h-BN, et al.) on wafer and foil substrates
  • Glovebox system for sensitive materials and maximum user safety
  • Dual channel showerhead for improved efficiency plasma showerhead technology for process flexibility
  • Run-vent lines for fast switching between precursors for maximum control over precursor delivery
  • Up to 8 MO (metal organic) sources
  • Temperatures up to 1050 °C

Product Features

  • Cold wall thermal and plasma enhanced CVD modular platform
  • Up to 10 gas sources
  • Remote and substrate plasma
  • Automatic process control with proven recipes
  • Multi-user management and reporting tools
  • Safety system with full data logging

Substrate size / configurations

  • up to 4 inch
  • Turbo pumping
  • In-situ options available

BM NOVO

Your contact person

Product Management

Dr. Jens Voigt

Director