Several AIXTRON AIX 2000/2400 MOCVD Reactor Systems now in operation at VPEC for HEMTs, HBTs and LEDs

AIXTRON is pleased to report that the young Taiwanese high tech company, Visual Photonics Epitaxy Co. Ltd. (VPEC), now has several AIX 2000/2400 mass production MOCVD reactor systems in operation at its facility in Chung Li.

Set up in 1996, VPEC is specialised in the production of epitaxial wafers. In particular, VPEC uses the AIXTRON MOCVD systems to produce high brightness LED epitaxial wafers for various industrial and commerical applications as well as HBT and HEMT epitaxial wafers for telecommunication applications. The company has a monthly output of around 2,000 4 inch wafers and achieves excellent results on the AIXTRON equipment, demonstrating state of the art uniformity and reproducibility. As an example, thickness uniformity with less than 1.89% of total thickness variation is achieved across a 4 inch HBT wafer with less than 1.82% of total thickness variation over 10 runs. VPEC has expressed its high satisfaction with the results achieved on the AIXTRON equipment.

AIXTRON is by far the largest supplier of MOCVD equipment in Taiwan, one of the company´s fastest growing markets. The company has already sold numerous mass production systems to companies such as United Epitaxy Corporation, Epistar and ITRI/OES. VPEC´s success with AIXTRON equipment again confirms its mass production systems as the world standard production tool for optoelectronic and microelectronic applications. The two-flow horizontal reactor permits the handling of up to 5 x 4 inch, 8 x 3 inch or 15 x 2 inch wafers. The reactor has a laminar flow design without turbulence for precise control of the material composition, p- and n-doping and the achievement of ultra sharp interfaces. Wafer rotation is provided by the patented Gas Foil Rotation^®. The machines are manufactured according to the highest quality standards, including AIXTRON´s ISO 9001 certification, the European CE as well as high German engineering standards.