!!! Press Release !!! HP Laboratories, Palo Alto decides for AIXTRON Nitride Reactor AIXTRON is pleased to announce that Hewlett-Packard Laboratories, Palo Alto, has purchased a new GaN MOCVD system AIX 200/4 HT from AIXTRON Inc. The system will be used in the advanced research of AlGaInN structures for LEDs and lasers. According to S.Y. Wang, Hewlett Packard Laboratories Program Manager, "the decision was based on the well proven performance and high degree of flexibility of the AIX 200/4 HT system". Industry experts have given clear preference to the AIXTRON 200/4 HT reactor concept for a number of reasons. In addition to its large capacity and high throughput the AIXTRON design is based on a two-flow reactor with pure laminar horizontal flow. This guarantees excellent wafer uniformity with very high efficiency in the use of process gases. It also ensures ultimate performance with respect to interface abruptness and offers the fast heating/cooling capability required to make Nitride based LEDs, as well as providing an additional in-situ cleaning feature. Using wafer rotation provided by the patented Gas Foil Rotation®, the Planetary Reactor® series, has been developed for ultra-high uniform growth of III-V and II-VI semiconductors and other materials in R & D and production. The reactor is available for operation up to 1200° C, with an optional extension up to 1600° C for the growth of SiC for the manufacturing of Nitride-based lasers on SiC buffer layers. The AIX 200/4 HT GaN system has already been supplied to many well-known companies and institutions such as Northwestern University, Daimler-Benz, Frankfurt and the Fraunhofer-Institut, Freiburg. To continue the fast pace of progress in the field of Nitride-based III-V material applications, AIXTRON is collaborating with leading partners, universities, government R&D and commercial customers from industry. An ISO 9001 certified company, AIXTRON provides a wide range of epitaxial systems for MOVPE, VPE and LPE from R & D oriented systems up to large-scale production systems for up to 95 x 2" wafers. Among AIXTRON's list of industrial clients are names such as Alcatel, AT&T, GM, IBM, Motorola, NEC, Philips, Rockwell, Siemens and many more. This new order represents the leading edge technology in the world and is based on the extremely successful development effort since the Nitride program was launched at AIXTRON in 1992. For GaN applications meanwhile, the AIX 2000 HT, AIX 200/4 HT and AIX 200 RF reactors are highly successful around the world. Nitride retrofist and upgrades are also available for other AIXTRON systems. For further information please contact:
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