!!! Press Release !!!

AIXTRON is pleased to announce that Hewlett-Packard, San José, has recently purchased additional MOCVD planetary systems which will be installed and ready for operation in early 1999.

Industry experts have given clear preference to the AIXTRON planetary reactor concept for several reasons. The Planetary Reactor^® concept has many well-known advantages. These include its low Cost of Ownership due to high process efficiency, large capacity, reliability and throughput. In addition, the AIXTRON design is based on a two-flow reactor with horizontal laminar flow. This guarantees excellent wafer uniformity with very high efficiency in the use of process gases. It also ensures ultimate performance with respect to interface abruptness and offers the fast heating/cooling capability required to make Nitride based LEDs. The AIXTRON design also provides an additional in-situ cleaning option. Using wafer rotation provided by the patented Gas Foil Rotation^®, the Planetary Reactor series has been developed for ultra-high uniform growth of III-V and II-VI compound semiconductors and other materials in R&D and production. The reactor is available for operation up to 1200° C, with an optional extension up to 1600° C for the growth of SiC for the manufacturing of Nitride-based lasers on SiC buffer layers.

In order to continue the fast pace of progress in the field of Nitride-based III-V material applications, for both LEDs and Lasers (for DVD), AIXTRON is collaborating with leading partners, universities, government R&D (e.g. Fraunhofer Inst. Freiburg, Germany, Meijo Univ., Japan, Ulm Univ., Germany, Northwestern Univ. Evanston, USA, etc...), as well as commercial customers from industry.

As a supplier of many fast-growing markets, AIXTRON´s list of industrial customers includes many of the world´s leading opto and microelectronics concerns. In addition to H-P, customers include companies such as Alcatel, EPI, Epitronics, GM, IBM, Kopin, Lucent, Motorola, NEC, Nortel, Philips, Rockwell, Samsung, Siemens, Thomson and many more. An ISO 9001 certified company, AIXTRON provides a wide range of epitaxial systems for MOVPE, VPE and LPE from R & D oriented systems up to large-scale production systems for up to 95 x 2" wafers. The AIX 3000 system, designed for high throughput of 95 x 2" wafers per run for the production of compound semiconductors for solar cells in satellite applications, is the world´s largest MOCVD

production system. AIXTRON´s systems for GaN applications, the AIX 2000 HT, AIX 200/4 HT and AIX 200 RF reactors, are highly successful around the world. Nitride retrofits and upgrades are also available for other AIXTRON systems.

For further information please contact:

© AIXTRON AG, July 23, 1998

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