The two-flow horizontal Planetary Reactor^® is recognized as the most widely used multiwafer MOCVD reactor for compound semiconductor applications. The reactor concept allows laminar gas flow without turbulences for precise control of the material composition and achievement of ultra-sharp interfaces. Ultra-high uniformity along with high growth efficiency on multiple 2, 3, 4 or 6 inch wafers is achieved through wafer rotation by the patented Gas Foil Rotation^®.

AIXTRON has increased its world wide market share to more than 40%. In Japan AIXTRON has received several new orders within the first four months of 1999 and plans to further strengthen its position in the Japanese market. AIXTRON is proud to announce that Seiko Epson, a world famous company, has become its customer. AIXTRON is looking forward to a bright future in Japan and, as an additional step, AIXTRON’s partner company Moritani & Co., Ltd. in Japan expanded their sales team by two additional persons.

AIXTRON has installed over 300 systems worldwide, provides an extensive service and support network for maintenance and upgrading and is represented in over 15 countries. Among AIXTRON's list of further industrial clients are names such as Alcatel, Conexant, EPI, Epistar, Epitronics, Honeywell, IBM, Infineon (former Siemens), ITT, Kopin, Lucent, Motorola, NEC, Osram, Philips, Samsung, Uniphase, UEC, VPEC and numerous Japanese corporations. AIXTRON systems have also been installed in many of the world's most renowned research institutes including JPL, Sandia Nat. Lab., Fraunhofer Institute, ITRI-OES and CNRS. AIXTRON is very active in advancing MOCVD technology through collaborations and joint R&D projects with major partners worldwide.