!!! Press Release !!!


SiCED Orders an EPIGRESS VP2000HW Hot-Wall Planetary Reactor®
for Mass Production of SiC Epitaxial Wafers


EPIGRESS AB is pleased to announce the sale of a multiwafer VP2000HW Hot-Wall Planetary Reactor® (7x2" and 5x3") to SiCED Electronics Development GmbH & Co. KG, located in Erlangen, Germany. SiCED will produce SiC epitaxial wafers for electronic devices. SiCED selected the VP2000HW reactor because of its proven production capability with respect to parameters such as throughput, homogeneity and material quality. The VP2000HW is the newest addition to the Planetary Reactor® family, and includes an actively controlled Hot-Wall feature.

EPIGRESS, a member of the AIXTRON Group, offers a wide range of systems for SiC CVD and sublimation growth. The portfolio includes single and multiwafer CVD reactors based on the hotwall concept. EPIGRESS provides a global service and support network for maintenance, and is represented in more than 15 countries.

EPIGRESS is the leading supplier of SiC CVD equipment for production and R&D, with numerous renowned customers worldwide such as Linköping University, IKZ Berlin, CEA LETI Grenoble, ACREO Kista, Purdue University, Northrop Grumman, ABB, Okmetic and Sterling Semiconductors as well as numerous Japanese corporations.

SiCED is a joint venture of Siemens AG and Infineon Technologies AG and is a leading R&D company for SiC related electronic devices.

For more information about SiCED please contact Dr D. Stephani, SiCED GmbH & Co. KG, Paul-Gossen Str. 100, D-91052 Erlangen.

For more information about Epigress AB, our different SiC CVD systems and our Technology Transfer Packages, please contact us directly or visit our web site at www.epigress.com.

LUND, November 24, 2000

Frank Wischmeyer
Product Manager SiC

© AIXTRON AG, November 24, 2000


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