KIST ADVANCING RESEARCH INTO NOVEL FIBER OPTIC NETWORK DEVICES

!!! Press Release !!!

KIST advancing Research into novel Fiber Optic Network Devices

using AIXTRON AIX 200/4-RF R&D MOCVD System and EpiTune

II in-situ Monitoring Tool

Aachen / Seoul, July 2 2003 - AIXTRON is pleased to announce the receipt of a purchase order for an AIX 200/4-RF MOCVD system from the Nano Device Center of the Korea Institute of Science and Technology (KIST). KIST, located in Seoul, Korea, was founded in 1966 and is one of the most important multidisciplinary research centers of South Korea; the new AIXTRON MOCVD system equipped with an EpiTune II in-situ monitoring tool will be used for research on newly developed GaAs and InP based materials such as GaInAsN for next generation long wavelength semiconductor lasers for broad band data transmission in fiber communication networks.

Dr. Kim, General Manager at KIST comments: "The AIXTRON 200/4 RF system will take a key position in the matrix of our interdisciplinary research focused on novel materials and nano-devices. The impressive system flexibility and high grade of control, which will enable us to grow numerous challenging material systems, has been the key factor for our decision to purchase this AIXTRON system. The EpiTune II in-situ monitoring tool, which can monitor processes at a temperature range between 400° C and 1600°C, will allow us to quickly exploit the crucial parameters for successful growth of semiconductor devices.”

Dr. Bastian Marheineke, Senior Department Manager, Sales Asia Pacific adds: "We are very pleased that the scientists of the Korean Institute of Science and Technology have chosen our technology for their next generation datacom devices research and have agreed to enter into collaboration with AIXTRON. The capability to grow various kinds of highest quality materials and quantum well structures as well as its excellent reproducibility makes AIXTRON’s 200 series systems the perfect choice for research, which has been honored by numerous scientists worldwide."

Based on the extremely successful AIX 200/4 reactor series, the stainless steel version AIX 200/4 RF-S for growth at high temperatures offers high flexibility in the choice of in-situ measurement methods. Numerous optical ports allow for the connection of AIXTRON’s innovative EpiTune and Epi-RAS instruments for in-situ monitoring of growth rate, temperature, structure and optical properties of the crystal.

AIXTRON is, as verified by VLSI Research Inc, the world leading supplier of equipment for semiconductor epitaxy. Its equipment is used by a diverse range of customers worldwide to manufacture critical, advanced components such as HBTs, PHEMTs, MESFETs, Lasers, LEDs, Detectors and VCSELs used in fiber optic communications systems, wireless and mobile telephony applications, optical storage devices, illumination, signaling and lighting, as well as a range of other leading edge technologies. AIXTRON AG (FSE: AIX ISIN DE0005066203) is listed in the Prime Standard and Tec-DAX of the German Stock Exchange (Deutsche Börse) and is included in the Dow Jones Sustainability Index World and the MSCI World Index.

For further information please contact:

Dr. Claus Ehrenbeck
Head of Investor Relations and
Corporate Communications
AIXTRON AG
Kackertstr. 15 - 17
D-52072 Aachen, Germany
Phone:+49 241 8909 444
Fax: +49 241 8909 445
E-mail: invest@aixtron.com