!!! Press Release !!!

First Diamond deposition system to be shipped to Russia

Aachen/ Nizhny Novgorod, 23 April 2003, – AIXTRON is pleased to confirm the upcomming installation of an AIX P6 MPCVD (Microwave Plasma Chemical Vapor Deposition) reactor for deposition of Diamond films at GYCOM Ltd., Russia. The system will be operated at the Institute of Applied Physics (IAP) Russian Academy of Science in Nizhny Novgorod, the scientific partner of world-known microwave vacuum electronic company GYCOM Ltd. The main product-line of the company is gyrotrons, which are high power microwave sources typically used in industrial heat treatment and heating of fusion plasmas. Furthermore, the CVD-grown diamond discs will be used as gyrotron windows. GYCOM’s gyrotron project forms part of Russian side participation in the international project ITER (International Thermonuclear Experimental Reactor), which aims at developing future electric power stations on the basis of nuclear fusion.

Dr. Anatoly Vikharev, Institute of Applied Physics (IAP) comments: "Diamond Technology is a key to the successful realization of our gyrotron project. We made our purchase decision based on a careful evaluation of different CVD technologies and it is our considered opinion that the AIX P6 Reactor will put us in a position to supply uniform and highest quality diamond material over large areas, which is compulsory for the gyrotron windows."

Paul Hyland, President and CEO of AIXTRON adds: "GYCOM is addressing a very promising future technology and we are glad to have an opportunity to participate as a supplier and co-operation partner. The AIX P6 production tool will ensure that GYCOM remains a step ahead in serving the gyrotron market and we very much look forward to further co-operations in the future."

Diamond Technology is part of AIXTRON’s strategy to further extend the scope of applications for its core competency. Both the AIX P6 (up to 3" wafer size) and the AIX P60 (up to 6" wafer size) MPCVD ellipsoid diamond reactors feature highly advanced and patented diamond deposition technology. This includes high-density plasma with an ideal shape surrounding the substrate resulting in high growth rates and a homogeneous deposition over large areas. The plasma is wall-contact free and extremely stable, allowing for a long-term controlled high purity deposition. The systems are computer controlled and custom designed to accommodate various gas supply, doping and in-situ monitoring needs.

Typical applications for Diamond Technology include heat sinks for electronic devices such as laser diodes and microwave power transistors, next generation SAW (surface acoustic wave) devices used for telecommunication bandpass filters, optical windows and lenses for high power lasers, high thermal load and mechano-optical applications and for use under harsh environmental conditions. Further applications include electrochemical electrodes, biomedical devices and hard coatings.

AIXTRON is, as verified by VLSI Research Inc., the world leading supplier of equipment for semiconductor epitaxy. Its equipment is used by a diverse range of customers worldwide to manufacture critical, advanced components such as HBTs, PHEMTs, MESFETs, Lasers, LEDs, Detectors and VCSELs used in fiber optic communications systems, wireless and mobile telephony applications, optical storage devices, illumination, signaling and lighting, as well as a range of other leading edge technologies. AIXTRON AG (FSE: AIX ISIN DE0005066203) is listed in the Prime Standard and Tec_DAX of the German stock exchange (Deutsche Börse AG) and is included in the Dow Jones Sustainability Index World and the MSCI World Index.

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© AIXTRON AG, 23  April 2003

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