!!! Press Release !!!

A NEW ERA IN GaAs TECHNOLOGY
AIXTRON R&D Team achieves first 8" GaAs Wafer MOCVD Epi Structures

Aachen, October 23rd, 2002 - For the first time ever, MOCVD processes for multi-wafer 8" GaAs substrates with outstanding performances have been demonstrated. Based on extensive numerical modeling, the existing AIX 2600 G3 reactor, which is well known for its productivity and efficiency advantages, was upscaled in order to allow multiple 8" growth. Finally, AIXTRON's in-house R&D group could demonstrate the novel reactor's 8" capabilities growing first GaAs and AlGaAs structures. As substrates, 8" GaAs wafers from the Freiberger Compound Materials GmbH were used.

Process results obtained during this development program demonstrate an excellent scalability of the existing 4" and 6" processes to 8". Uniformities at 1% across the entire 8" wafer could be achieved immediately. Even at this early stage, it is evident that material quality and homogeneity do not differ from results obtained on the well established 6" systems.

"We are convinced that 8" will soon become the new standard for high volume manufacturing, especially in the field of high frequency electronics" says Dr. Bernd Schulte, Executive Vice President and COO of AIXTRON. "The continuous efforts of the Compound Semiconductor Industry to increase its productivity will require larger substrates. Thus we decided to develop an MOCVD tool for 8" wafer size as early as possible." Already several AIX 2600G3 systems have been installed at customers for the production of SiGe epi structures, using multiple 8" substrates.

With an installed base of well over 650 systems world-wide, AIXTRON is, as verified by VLSI Research Inc., the world leading supplier of equipment for semiconductor epitaxy and has been rated once more amongst the 2002 10 BEST in its category in the most recent VLSI Customer Satisfaction Survey. Its equipment is used by a diverse range of customers worldwide to manufacture critical, advanced components such as HBTs, PHEMTs, MESFETs, Lasers, LEDs, Detectors and VCSELs used in fibre optic communications systems, wireless and mobile telephony applications, optical storage devices, illumination, signaling and lighting, as well as a range of other leading edge technologies. The company has an extensive service and support network in over 15 countries. AIXTRON's many customers include Agere, Alcatel, Anritsu, ATMI, Avalon, AXT, Epson, Honeywell, Infineon, IQE, IQE Silicon Compounds, ITT, JDS-Uniphase, Kopin, LumiLeds, Mitsubishi, Motorola, Nortel, Optospeed, Osram, Procomp, Samsung, Showa Denko, Siemens, ST Microelectronics, Sumitomo, Thales, UEC, VPEC as well as numerous Japanese corporations. AIXTRON systems have also been installed in the most renowned research institutes worldwide, including CNRS, Fraunhofer Institute, ITRI-OES, JPL, Meijo University, NDL Taiwan, Research Center Jülich, RIKEN, Sandia Nat Lab, Tsinghua University and the University of Tokyo. AIXTRON is very active in advancing MOCVD technology through collaborations and joint R&D projects with major partners worldwide. AIXTRON AG (FSE: AIX ISIN DE0005066203) is included in the Dow Jones Sustainability Index World and the MSCI World Index.

For further information please contact:

© AIXTRON AG, October 23, 2002

Homepage | Contact | About Aixtron | Products & Services | Customer Support | R & D | Production Results | What's new | Events

© 1996 - 2003 by AIXTRON AG