DEPOSITION SYSTEM FOR COMPOUND SEMICONDUCTORS

AIX G5+ C

“State-of-the-art Planetary reactor module for advanced GaN application on 150/200 mm substrates (Si/Sapphire/SiC) increases productivity and wafer performance”

Key Benefits

  • Chosen by the best in the industry
  • Highest throughput
  • Lowest Cost of Ownership
  • Highest yield performance
  • 1st fully automated MOCVD platform with Cl2 in-situ cleaning and cassette-to-cassette wafer handler

Product Features

  • Cost advantages of a batch reactor combined with the unique axis symmetric on-wafer uniformity of a single wafer reactor with respect to:
    • wafer bow
    • layer thickness, material composition, dopant concentration
    • component yield
  • Warm ceiling provides lowest heat flux through the wafers
    • Minimized wafer curvature due to minimal vertical temperature gradients
    • Enables the use of Si wafers with standard thickness
  • Wafer temperature optimization through customer-specific design of the substrate pockets

Configurations

  • 8x150 mm
  • 5x200 mm

AIX G5+ C reactor module with cassette-to-cassette wafer handler

Your contact person

Marketing

Vincent Meric

Vice President Marketing

Service

AIXTRON SE (Headquarters)

AIXTRON 24/7 Technical Support Line

AIXTRON Europe

AIXTRON Ltd (UK)

AIXTRON K.K. (Japan)

AIXTRON Korea Co., Ltd.

AIXTRON Taiwan Co., Ltd. (Main Office)

AIXTRON Inc. (USA)

Products

Vincent Meric
Vice President Marketing

Career

Laura Preinich
Recruiter

Tom Lankes
Talent Acquisition Expert- Ausbildungsleitung

Sustainability

Christoph Pütz
Senior Manager ESG & Sustainability

Company & Investor Relations

Carsten Werle
Director Investor Relations (Interim)

Press & Public Relation

Ragah Dorenkamp
Director Corporate Communications

Research & Development

Prof. Dr. Michael Heuken
Vice President Advanced Technologies